Technical Notes
1.Organometallic precursor for chemical vapour deposition (CVD) of Pt films1-3
References:
1.Chem. Vap. Deposition, 2003, 9, 321.
2.Jpn. J. Appl. Phys., 2004, 43, L624.
3.J. Vac. Sci. Technol. A, 2007, 25, 104.
Strem
二氯[rel- [N(S)]-N- [2-(二苯基膦基-κO)乙基] -2-[(R)-叔丁硫基-κS]乙胺-κN](三苯基膦)钌, Dichloro[rel-[N(S)]-N-[2-(diphenylphosphinyl-κO)ethyl]-2-[(R)-tert-butylthio-κS]ethanamine-κN](triphenylphosphine) ruthenium
N- [2-(二苯基膦基)乙基] -2-[(4-甲基苯基)硫代]-乙胺, N-[2-(Diphenylphosphinyl)ethyl]-2-[(4-methylphenyl)thio]-ethanamine
Tetrabutyphosphonium bromide
四正丁基溴化膦
[S(R)]-N-[(1R)-1- [2-(二苯基膦基)苯基] -2,2-二甲基丙基] -2-甲基-2-丙烷亚磺酰胺, [S(R)]-N-[(1R)-1-[2-(Diphenylphosphino)phenyl]-2,2-dimethylpropyl]-2-methyl-2-propanesulfinamide
Tetrabutylphosphonium chloride
四丁基氯化膦
三丁基乙基溴化膦, Tributyl(ethyl)phosphonium bromide
[S(R)]-N-[(1S)-1- [2-(9-蒽基)苯基] -2-(二苯基膦基)乙基] -N,2-二甲基-2-丙烷亚磺酰胺, [S(R)]-N-[(1S)-1-[2-(9-Anthracenyl)phenyl]-2-(diphenylphosphino)ethyl]-N,2-dimethyl-2-propanesulfinamide
[S(R)]-N-[(R)-[6-(二苯基膦基)苯并[d] [1,3]二恶酚-5-基] -1-萘甲基] -N,2-二甲基-2-丙烷亚磺酰胺 , [S(R)]-N-[(R)-[6-(Diphenylphosphino)benzo[d][1,3]dioxol-5-yl]-1-naphthalenylmethyl]-N,2-dimethyl-2-propanesulfinamide
[S(R)]-N-[(R)-[2,4,6-(三异丙基苯基))甲基] -4-甲氧基苯基] [2-(二环己基膦基)苯基]甲基] -2-甲基-2-丙烷亚磺酰胺 , [S(R)]-N-[(R)-[2,4,6-(Triisopropylphenyl))methyl]-4-methoxyphenyl][2-(dicyclohexylphosphino)phenyl]methyl]-2-methyl-2-propanesulfinamide
[S(R)]-N-[(R)-[3,5-双(1,1-二甲基乙基)-4-甲氧基苯基] [2-(二环己基膦基)苯基]甲基] -N,2-二甲基-2 -丙烷亚磺酰胺, [S(R)]-N-[(R)-[3,5-Bis(1,1-dimethylethyl)-4-methoxyphenyl][2-(dicyclohexylphosphino)phenyl]methyl]-N,2-dimethyl-2-propanesulfinamide