Technical Notes:
1.AL D/CVD precursor for Iridium thin film deposition
References:
1.J. Mater. hem. 1991, 1, 551.
2.J. Am. chem. Soc. 1991 1 13, 2537.
3.Jpn. J. Appl Phys. 1999, 38, L 1052.
4.J. Vac. Sci. Technol. A, 2000, 18, 10.
5.J. Therm. Anal. alorim. 2009, 96, 261.
6.Surf. oat, Tech.2003, 163 208.
7.Chem. Vap. Deposition 2003, 9, 301.
8.Chem. Mater. 2004. 16, 2457.
9.J. Mater. hem.. 2006, 16, 780.
10.J. Appl Electrochem. 2010, 40, 997.
Strem
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