Technical Notes:
1.ALD/CVD precursor mainly used for TiN1, reviewand TiO2 based thin film depositions.
References:
1.J. Appl. Phys. 2013 1 13 021301 2
2.Microelectron Eng.2009 86 72. 3.J. Vac. Sci Tech. A. 2018 36 06A105. 4.Appl Surf. Sci 2018 462 1029.Strem