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位置: 首页> 品牌> Sigma-Aldrich> Phosphorus implant in silicon depth profile standard

Phosphorus implant in silicon depth profile standard

货号
NIST2133
包装型号
规格纯度
NIST?SRM?2133
价格
34489 *本价格含增值税费
促销
服务
  • 原厂保证
  • 包邮
  • 增值税票
数量
- +
半岛bd体育手机客户端 名称:
Phosphorus implant in silicon depth profile standard
半岛bd体育手机客户端 介绍:

半岛bd体育手机客户端 说明

一般描述

This Standard Reference Material (SRM) is intended for use in calibrating secondary ion response to minor and trace levels of phosphorus in a silicon matrix by the analytical technique of secondary ion mass spectrometry (SIMS). SRM 2133 is intended for calibrating the response of a SIMS instrument for phosphorus in a silicon matrix under a specific set of instrumental conditions. It may also be used by a laboratory as a transfer standard for the calibration of working standards of phosphorus in silicon. This SRM consists of a 1 cm × 1 cm single crystal silicon substrate that has been ion-implanted with the isotope 31P at a nominal energy of 100 keV. For more information, please refer to the COA and SDS.

SRM 2133_cert SRM 2133 _SDS

法律信息

NIST is a registered trademark of National Institute of Standards and Technology
SRM is a registered trademark of National Institute of Standards and Technology

基本信息

NACRES NA.24

半岛bd体育手机客户端 性质

质量水平 100
等级 certified reference material
包装 pkg of each
manufacturer/tradename NIST?
application(s) pharmaceutical (small molecule)
格式 matrix material

安全信息

储存分类代码 13 - Non Combustible Solids
WGK WGK 3
闪点(F) Not applicable
闪点(C) Not applicable

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