X-Y scan range
X-Y鏂瑰悜鎵弿鑼冨洿 |
90?m x 90?m typical, 85?m minimum
90?m 脳 90?m 鍏稿瀷鍊硷紝鏈€灏?5?m |
Z range
Z鏂瑰悜鎵弿鑼冨洿 |
10?m typical in imaging and force curve modes, 9.5?m minimum
鍦ㄦ垚鍍忓強鍔涙洸绾挎ā寮忎笅鍏稿瀷鍊间负10渭m锛涙渶灏?.5渭m |
Vertical noise floor
鍨傜洿鏂瑰悜鍣煶鍩哄簳 |
< 30pm RMS in appropriate environment typical imaging bandwidth (up to 625Hz)
< 30pmRMS, 鍦ㄥ悎閫傜殑鐜鍙婂吀鍨嬬殑鎴愬儚甯﹀(杈惧埌625Hz) |
X-Y position noise(closed-loop)
X-Y瀹氫綅鍣煶(闂幆) |
鈮?.15nm RMS typical imaging bandwidth (up to 625Hz)
鈮?.15nm RMS锛屽吀鍨嬫垚鍍忓甫瀹?杈惧埌625Hz) |
X-Y position noise(open-loop)
X-Y瀹氫綅鍣煶(寮€鐜? |
鈮?.10nm RMS typical imaging bandwidth (up to 625Hz)
鈮?.10nm RMS锛屽吀鍨嬫垚鍍忓甫瀹?杈惧埌625Hz) |
Z sensor noise level(closed-loop)
Z浼犳劅鍣ㄥ櫔闊虫按骞?闂幆) |
35pm RMS typical imaging bandwidth (up to 625Hz);
50pm RMS, force curve bandwidth (0.1Hz to 5kHz)
35pm RMS锛屽吀鍨嬫垚鍍忓甫瀹?杈惧埌625Hz);
50pm RMS锛屽姏鏇茬嚎鎴愬儚甯﹀(0.1Hz to 5kHz) |
Integral nonlinearity(X-Y-Z)
鏁翠綋绾挎€ц宸?X-Y-Z) |
< 0.5% typical
< 0.5% 鍏稿瀷鍊稽/span> |
Sample size/holder
鏍峰搧灏哄/澶瑰叿 |
210mm vacuum chuck for samples, 鈮?10mm diameter, 鈮?5mm thick
210mm 鐪熺┖鍚哥洏鏍峰搧鍙帮紱澶瑰叿锛岀洿寰 鈮?10mm, 鍘氬害 鈮?5mm |
Motorized position stage
(X-Y axis)
鐢靛姩瀹氫綅鏍峰搧鍙?X-Y杞?
|
180mm 脳 150mm inspectable area;
2?m repeatability, unidirectional;
3?m repeatability, bidirectional
180mm 脳 150mm鍙鍖哄煙;
鍗曞悜2?m閲嶅鎬?
鍙屽悜3?m閲嶅鎬?/span> |
Microscope optics
鏄惧井闀滃厜瀛︾郴缁烖br/> |
5-megapixel digital camera;
180?m to 1465?m viewing area;
Digital zoom and motorized focus
浜旂櫨涓囧儚绱犳暟瀛楃収鐩告満;
180?m鑷?465?m鍙鑼冨洿;
鏁板瓧缂╂斁鍙婅嚜鍔ㄥ鐒﹀姛鑳键/span> |
Controller
鎺у埗鍣?/span> |
NanoScope V
NanoScope V鍨嬫帶鍒跺櫒 |
Workstation
宸ヤ綔绔橖/span> |
Integrates all controllers and provides ergonomic design with immediate physical
and visual access
鏁村悎鎵€鏈夋帶鍒跺櫒銆佺粨鍚堜汉浣撳伐瀛﹁璁★紝鎻愪緵鐩存帴鐨勭墿鐞嗘垨鍙鎺ュ彛 |
Vibration isolation
鎸姩闅旂粷 |
Integrated, pneumatic
鏁翠綋寮忔皵鍔ㄥ噺闇囧彴 |
Acoustic isolation
澹伴煶闅旂粷 |
Operational in environments with up to 85dBC continuous acoustic noise
鍙殧缁濈幆澧冧腑85 dBC鐨勬寔缁櫔闊颤/span> |
AFM modes
AFM妯″紡 |
Standard:ScanAsyst, PeakForce Tapping, TappingMode (air), Contact Mode, Lateral
Force Microscopy, PhaseImaging, Lift Mode, MFM, Force Spectroscopy, Force Volume,
EFM, Surface Potential, Piezoresponse Microscopy, Force Spectroscopy;
Optional:PeakForce QNM, HarmoniX, Nanoindentation, Nanomanipulation,
Nanolithograpy, Force Modulation (air/fluid), TappingMode (fluid), Torsional
Resonance Mode, Dark Lift, STM, SCM, C-AFM, SSRM, PeakForce TUNA,TUNA,
TR-TUNA, VITA |
Certification
璁よ瘉 |
CE |
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