Polycrystalline diamond film is prepared by a chemical vapour deposition (CVD) process, the diamond film being supported on a suitable substrate of a given orientation - generally a high purity silicon wafer is used. Alternatively, depending upon the thickness of the film, it can be free standing. Generally, the surface finish of the material is "as deposited", although the material can be supplied lapped or polished, at extra cost. The thermal conductivity, grain size, transparency and surface roughness depend upon the thickness of the CVD polycrystalline diamond film. For prices or for a quotation for other diamond films please fax your requirements to our Technical Service department who will be pleased to help you.

订货号	包装规格
Disc
526-731-71	100mm

半岛bd体育手机客户端 参数

Description[描述]	Ultrananocrystalline Diamond (UNCD)
Diameter[直径]	100mm
Grade[等级]	AQUA 100
Substrate[基底]	Silicon
Thickness[厚度]	0.001mm

其他参数

公差

直径	<100mm	±1mm
	≥100mm	+2% / -1%
厚度		±20%
长度 1	<100mm	±1mm
	≥100mm	+2% / -1%
长度 2	<100mm	±1mm
	≥100mm	+2% / -1%