Polycrystalline diamond film is prepared by a chemical vapour deposition (CVD) process, the diamond film being supported on a suitable substrate of a given orientation - generally a high purity silicon wafer is used. Alternatively, depending upon the thickness of the film, it can be free standing. Generally, the surface finish of the material is "as deposited", although the material can be supplied lapped or polished, at extra cost. The thermal conductivity, grain size, transparency and surface roughness depend upon the thickness of the CVD polycrystalline diamond film. For prices or for a quotation for other diamond films please fax your requirements to our Technical Service department who will be pleased to help you.

Only available as part of a set with DI001060, DI001065 and DI001070.

璁㈣揣鍙饵/strong>	鍖呰瑙勬牸
Sizes
620-532-08	25mm x 25mm

浜у搧鍙傛暟

Description[鎻忚堪]	Ultrananocrystalline Diamond (UNCD)
Grade[绛夌骇]	AQUA 50
Substrate[鍩哄簳]	Silicon
Thickness[鍘氬害]	0.002mm

鍏朵粬鍙傛暟

鍏樊

鐩村緞	<100mm	±1mm
	鈮?00mm	+2% / -1%
鍘氬害		±20%
闀垮害 1	<100mm	±1mm
	鈮?00mm	+2% / -1%
闀垮害 2	<100mm	±1mm
	鈮?00mm	+2% / -1%