应用
Silicon(IV) oxide sputtering target has low thermal expansion coefficient which makes it ideal for mirrors and optical flats. It is used for viewing windows, being transparent to wavelengths from around 0.2 to 3.5 microns, insulators for electronic applications and for semi-conductor manufacturing.

备注
Thickness tolerance: ^+0.025in; Diameter tolerance: ^+0.020in

基本信息

MDL
MFCD00011232

EINECS
231-545-4

分子式
SiO₂

分子量
60.09

灵敏度
Ambient temperatures.

溶解性
Insoluble in water.

安全信息

TSCA
是