应用
Cerium silicide is used as a surrogate material to investigate the feasibility of high-energy ball milling and Spark Plasma Sintering (SPS) for the production of uranium silicide.
备注
Incompatible with oxidizing agents.
基本信息
MDL
MFCD00168082
EINECS
234-602-1
分子式
CeSi2
分子量
196.29
熔点
1620°
密度
5.31
灵敏度
Ambient temperatures.
形态
3-15mm Pieces
溶解性
Insoluble in water.
安全信息
TSCA
是
阿法埃莎